PHE 103 UV/VIS NIR Spectroscopic Ellipsometer
Angstrom Advanced sets the standard in Ellipsometry-bringing the best in ellipsometry technology at the most affordable prices.Angstrom Advanced offers full range of ellipsometers for thin film thickness measurements, optical characterization for refractive index and extinction coefficient analysis (n & k). Our ellipsometers can be used for many different applications and are used in some of the most prestigious laboratories such as MIT, NASA, UC Berkeley, Yale University, Duke University, NIST and many more.
  • Quick measurement in the UV/VIS range 250 - 1100nm with motor spectrometer (monochromator)
  • Optional extension of spectral range into the NIR (700 - 1700nm) or (700 - 2300nm)
  • Optional extension of UV-VIS range (190 - 1100nm)
  • Transmission and variable angle reflection
  • Rotating polarizer provides accurate measurement of any polarization state
  • Step scan analyzer for high speed and low noise acquisition
  • Variable angle from 20-90° automated angle with 20-90° is also available
  • Vertical sample stage
  • Fast determination of thickness and refractive index of single or multi-layed samples
  • Broad range of Psi and Delta data are measured automatically and fitted through the PHE-103 ellipsometry software
  • PHE-103 ellipsometer software is the most comprehensive program available for data acquisition and analysis. It combines state-of-the-art mathematical fitting algorithms with a large selection of modeling options for fast and accurate data analysis. An advanced spectroscopic ellipsometry software
  • Built in library of material properties, includes several hundreds of material models
  • Mixtures of new materials are possible using known material properties

The PHE-103 ellipsometer is a new model which adds the Transmission and Variable Angle Reflection function. This variable angle spectroscopic ellipsometer operating in the spectral range 250 - 1100nm or 250-1700nm or 250-2100nm. In the PHE-103 a broad band white light source is used to illuminate the sample spot. The layer stack imparts a change in state of polarization to the light and is reflected back through the analyzer and into the detector; where it is measured under the ellipsometric parameters of Psi and Delta. The spectral dependence of the refractive index, dielectric constants of the materials and other parameters under measurement are determined by comparing the measured data to a theoretical model, which defines the layer structure in detail.

Our user friendly PHE Spectroscopic software allows the user to measure and analyze multiple material layers and complex thin film structures with mixed layers, interface layers and much more. The state-of-art software has several hundred material models. The PHE-102 ellipsometer includes all the hardware and software needed for acquiring and analyzing all sample data.
Materials Library
The PHE spectroscopic ellipsometer software has a model and film library with predetermined measurement parameters, which allows the operator to select an application and quickly execute a measurement. The library includes several hundred of different models.
Speed Typical measurement including data analysis 1~2 minutes
Thickness range of transparent films measurement 0 - 30000 nm
Thickness range absorptive films measurement 0 - 30000 nm
Refractive index ± 0.0001
Thickness accuracy ± 0.01nm
Range of angle of incidence 20 - 90°, automated angle with 20-90° available
Reflection angle steps 5° ± 0.01°
Spot size Ellipse ~ 1 mm × 3mm

Long term ( months ) ± 0.01° in D
Measurement time 1 s ~ 2.0 minutes
Sample stage Wafer chuck up to 200mm diameter
Sample stage adjustments Tilt and height
Sample alignment automated
Standard wavelength 250-1100nm, 250-1700nm, 250-2100nm